Developement of High Throughput Polarization Maintaining NSOM Probes

dc.contributor.advisorPhaneuf, Raymond Jen_US
dc.contributor.advisorDrew, Howard Den_US
dc.contributor.authorAdiga, Vivekananda Parampallien_US
dc.contributor.departmentMaterial Science and Engineeringen_US
dc.contributor.publisherDigital Repository at the University of Marylanden_US
dc.contributor.publisherUniversity of Maryland (College Park, Md.)en_US
dc.date.accessioned2005-08-03T14:31:48Z
dc.date.available2005-08-03T14:31:48Z
dc.date.issued2005-05-02en_US
dc.description.abstractHigh throughput, polarization maintaining probes for Near-field Scanning Optical Microscopy (NSOM) were fabricated by chemical etching. An aperture was formed with Focused Ion Beam after coating the tips with 300 nm of aluminum. Tips showed a typical far field polarization extinction ratio of 100 to 1. The throughput of the tips depends on the polarization of the incident light because of the boundary conditions imposed by elliptical aperture. We show NSOM images obtained with these probes on gold dots on a GaAs substrate. NSOM images show a contrast inversion on the gold dots compared to the far-field imaging. We were not able to determine the spatial resolution of the probes since the topographic effects dominate the optical response. Interference effects and variation of the light intensity in close proximity to the sample are observed and studied.en_US
dc.format.extent1271529 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.urihttp://hdl.handle.net/1903/2504
dc.language.isoen_US
dc.subject.pqcontrolledPhysics, Opticsen_US
dc.subject.pqcontrolledPhysics, Condensed Matteren_US
dc.titleDevelopement of High Throughput Polarization Maintaining NSOM Probesen_US
dc.typeThesisen_US

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