REU Report: A Simulated Study of Temperature as a Function of Gas Flow Rate in a Chemical Vapor Deposition Reactor

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dc.contributor.advisorAdomaitis, Raymond A.en_US
dc.contributor.authorWilson, Erin A.en_US
dc.contributor.departmentISRen_US
dc.date.accessioned2007-05-23T10:07:55Z
dc.date.available2007-05-23T10:07:55Z
dc.date.issued1999en_US
dc.description.abstractA study to further simulation research of a commercial chemical vapor deposition (CVD) reactor is presented. A simulation is created using the computational fluid dynamics software package, Fluent (version 4). The variation of gas temperature inside the reactor system, as a function of gas flow rate, is examined. Data is collected for trials of several initial flow rates and iterations. Results from Fluent are to be compared to data from other simulation techniques to test accuracy and reliability.en_US
dc.format.extent41362 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.urihttp://hdl.handle.net/1903/6058
dc.language.isoen_USen_US
dc.relation.ispartofseriesISR; UG 1999-9en_US
dc.subjectchemical process controlen_US
dc.subjectmathematical modelingen_US
dc.subjectsimulationen_US
dc.subjectdistributed information processingen_US
dc.subjectmanufacturablilityen_US
dc.subjectmicroprocessorsen_US
dc.subjectIntelligent Control Systemsen_US
dc.titleREU Report: A Simulated Study of Temperature as a Function of Gas Flow Rate in a Chemical Vapor Deposition Reactoren_US
dc.typeThesisen_US

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