REU Report: A Simulated Study of Temperature as a Function of Gas Flow Rate in a Chemical Vapor Deposition Reactor

Abstract

A study to further simulation research of a commercial chemical vapor deposition (CVD) reactor is presented. A simulation is created using the computational fluid dynamics software package, Fluent (version 4). The variation of gas temperature inside the reactor system, as a function of gas flow rate, is examined. Data is collected for trials of several initial flow rates and iterations. Results from Fluent are to be compared to data from other simulation techniques to test accuracy and reliability.