Electron-induced extended-fine-structure measurements of thin-film growth and reaction

Idzerda, Y. U.; Williams, Ellen D.; Einstein, Theodore L.; Park, R. L.

Electron-induced extended-fine-structure measurements of thin-film growth and reaction

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1987IdzerdaEAFSPRB.pdf (1.56 MB)

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Publication or External Link

https://doi.org/10.1103/PhysRevB.36.5941

Date

1987

Authors

Idzerda, Y. U.

Williams, Ellen D.

Einstein, Theodore L.

Park, R. L.

Citation

Y. U. Idzerda, E. D. Williams, T. L. Einstein, R. L. Park; Electron-induced extended-fine-structure measurements of thin-film growth and reaction. Physical Review B, 36, 11, 5941-5948, 1987.

DRUM DOI

https://doi.org/10.13016/seyo-oz3t

Abstract

The application of two electron-beam-induced extended-fine-structure (EFS) techniques (surface extended energy-loss fine structure (SEELFS) and extended appearance-potential fine structure (EAPFS)) to the study of thin films has been demonstrated by measurements on three well-characterized compositional phases of titanium deposited on Si(111).

URI (handle)

http://hdl.handle.net/1903/32276

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