Electron-induced extended-fine-structure measurements of thin-film growth and reaction
Electron-induced extended-fine-structure measurements of thin-film growth and reaction
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Date
1987
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Citation
Y. U. Idzerda, E. D. Williams, T. L. Einstein, R. L. Park; Electron-induced extended-fine-structure measurements of thin-film growth and reaction. Physical Review B, 36, 11, 5941-5948, 1987.
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Abstract
The application of two electron-beam-induced extended-fine-structure (EFS) techniques (surface extended energy-loss fine structure (SEELFS) and extended appearance-potential fine structure (EAPFS)) to the study of thin films has been demonstrated by measurements on three well-characterized compositional phases of titanium deposited on Si(111).