Electron-induced extended-fine-structure measurements of thin-film growth and reaction
dc.contributor.author | Idzerda, Y. U. | |
dc.contributor.author | Williams, Ellen D. | |
dc.contributor.author | Einstein, Theodore L. | |
dc.contributor.author | Park, R. L. | |
dc.date.accessioned | 2024-03-11T15:55:11Z | |
dc.date.available | 2024-03-11T15:55:11Z | |
dc.date.issued | 1987 | |
dc.description.abstract | The application of two electron-beam-induced extended-fine-structure (EFS) techniques (surface extended energy-loss fine structure (SEELFS) and extended appearance-potential fine structure (EAPFS)) to the study of thin films has been demonstrated by measurements on three well-characterized compositional phases of titanium deposited on Si(111). | |
dc.description.uri | https://doi.org/10.1103/PhysRevB.36.5941 | |
dc.identifier | https://doi.org/10.13016/seyo-oz3t | |
dc.identifier.citation | Y. U. Idzerda, E. D. Williams, T. L. Einstein, R. L. Park; Electron-induced extended-fine-structure measurements of thin-film growth and reaction. Physical Review B, 36, 11, 5941-5948, 1987. | |
dc.identifier.uri | http://hdl.handle.net/1903/32276 | |
dc.publisher | American Physical Society | |
dc.title | Electron-induced extended-fine-structure measurements of thin-film growth and reaction | |
dc.type | Article |
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