Electron-induced extended-fine-structure measurements of thin-film growth and reaction

dc.contributor.authorIdzerda, Y. U.
dc.contributor.authorWilliams, Ellen D.
dc.contributor.authorEinstein, Theodore L.
dc.contributor.authorPark, R. L.
dc.date.accessioned2024-03-11T15:55:11Z
dc.date.available2024-03-11T15:55:11Z
dc.date.issued1987
dc.description.abstractThe application of two electron-beam-induced extended-fine-structure (EFS) techniques (surface extended energy-loss fine structure (SEELFS) and extended appearance-potential fine structure (EAPFS)) to the study of thin films has been demonstrated by measurements on three well-characterized compositional phases of titanium deposited on Si(111).
dc.description.urihttps://doi.org/10.1103/PhysRevB.36.5941
dc.identifierhttps://doi.org/10.13016/seyo-oz3t
dc.identifier.citationY. U. Idzerda, E. D. Williams, T. L. Einstein, R. L. Park; Electron-induced extended-fine-structure measurements of thin-film growth and reaction. Physical Review B, 36, 11, 5941-5948, 1987.
dc.identifier.urihttp://hdl.handle.net/1903/32276
dc.publisherAmerican Physical Society
dc.titleElectron-induced extended-fine-structure measurements of thin-film growth and reaction
dc.typeArticle

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