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dc.contributor.advisorKrishnaprasad, Perinkulam S.en_US
dc.contributor.authorNewman, Andrew J.en_US
dc.contributor.authorKrishnaprasad, Perinkulam S.en_US
dc.contributor.authorPonczak, Samen_US
dc.contributor.authorBrabant, Paulen_US
dc.date.accessioned2007-05-23T10:05:52Z
dc.date.available2007-05-23T10:05:52Z
dc.date.issued1998en_US
dc.identifier.urihttp://hdl.handle.net/1903/5955
dc.description.abstractIn December 1996, a project was initiated at the Institute for Systems Research (ISR), under an agreement between Northrop GrummanElectronic Sensors and Systems Division (ESSD) and the ISR, to investigatethe epitaxial growth of silicon-germanium (Si-Ge) heterostructures in a commercial rapid thermal chemical vapor deposition (RTCVD) reactor. This report provides a detailed account of the objectives and results of work done on this project as of September 1997. The report covers two maintopics: modeling and model reduction. Physics-based models are developedfor thermal, fluid, and chemical mechanisms involved in epitaxial growth.Experimental work for model validation and determination of growth parameters is described. Due to the complexity and high computational demands of the models, we investigate the use of model reduction techniques to reduce the model complexity, leading to faster simulation and facilitating the use of standard control and optimization strategies.en_US
dc.format.extent2244357 bytes
dc.format.mimetypeapplication/pdf
dc.language.isoen_USen_US
dc.relation.ispartofseriesISR; TR 1998-45en_US
dc.subjectchemical vapor depositionen_US
dc.subjectepitaxial growthen_US
dc.subjectrapid thermalen_US
dc.subjectmodelingen_US
dc.subjectmodel reductionen_US
dc.subjectIntelligent Control Systemsen_US
dc.titleModeling and Model Reduction for Control and Optimization of Epitaxial Growth in a Commercial Rapid Thermal Chemical Vapor Deposition Reactoren_US
dc.typeTechnical Reporten_US
dc.contributor.departmentISRen_US


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