Development and characterization of high-strain electrodes

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dc.contributor.advisorSmela, Elisabethen_US
dc.contributor.authorDelille, Remi Alainen_US
dc.contributor.departmentMechanical Engineeringen_US
dc.contributor.publisherDigital Repository at the University of Marylanden_US
dc.contributor.publisherUniversity of Maryland (College Park, Md.)en_US
dc.date.accessioned2006-09-12T06:07:00Z
dc.date.available2006-09-12T06:07:00Z
dc.date.issued2006-08-31en_US
dc.description.abstractThis thesis, composed of three journal articles, presents a compliant electrode material, based on a novel fabrication procedure. The compliant electrodes consisted of a photopatternable, urethane matrix embedded with platinum nanoparticles. The first in the series of journal articles, "Benchtop Polymer MEMS," characterized the unloaded urethane matrix's compatibility with microfabrication and patterning processes. The second, "Compliant Electrodes Based on Platinum Salt Reduction in a Urethane Matrix," presented a unique manufacturing process for compliant electrodes, which exhibited a secant modulus under 10 MPa, an electrical conductivity of 1 S/cm, and maintained electrical conductivity under mechanical strains of 30%. The third, "High-Strain, High-Conductivity Photopatternable Electrodes," explored a modification to this fabrication method that yielded a dramatic improvement in performance: an electrical conductivity of 50 S/cm, mechanical strains of 150% without loss of conductivity, robustness after thousands of strain cycles, and low hysteresis.en_US
dc.format.extent23723066 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.urihttp://hdl.handle.net/1903/3935
dc.language.isoen_US
dc.subject.pqcontrolledEngineering, Mechanicalen_US
dc.subject.pquncontrolledstretchable conductorsen_US
dc.subject.pquncontrolledplatinum salten_US
dc.subject.pquncontrolledchemical reductionen_US
dc.subject.pquncontrolledhigh-strainen_US
dc.subject.pquncontrolledcompliant electrodesen_US
dc.titleDevelopment and characterization of high-strain electrodesen_US
dc.typeThesisen_US

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