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    FABRICATION AND MODELING OF SILICON CARBIDE BIPOLAR JUNCTION TRANSISTORS

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    Date
    2008-05-06
    Author
    Geil, Bruce
    Advisor
    Goldsman, Neil
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    Abstract
    The fabrication and modeling of Silicon Carbide (SiC) Bipolar Junction Transistors (BJT) and diodes for the development of high temperature power switches is presented. Silicon carbide processing including etching, implantation and ohmic contact fabrication are discussed. A 1-D computer model for SiC devices is developed that allows for temperature dependent calculations of current and potential in the device. The techniques that provide a unique ability to use either standard methods or the quasi Fermi method are provided. The modeled results are compared to experimental data and show very close correlation at room temperature but rapidly diverge at higher temperatures. Several temperature dependent variables that affect the model results are investigated to determine which calculations, if modified, would most improve the model accuracy. A perspective for future optimization of the model is given with an emphasis on the ability to calculate BJT currents.
    URI
    http://hdl.handle.net/1903/8244
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    • Electrical & Computer Engineering Theses and Dissertations
    • UMD Theses and Dissertations

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