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    A NEW APPROACH TO SPATIALLY CONTROLLABLE CVD

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    TR_2004-22.pdf (633.4Kb)
    No. of downloads: 702

    Date
    2004
    Author
    Choo, Jae-Ouk
    Adomaitis, Raymond A.
    Rubloff, Gary W.
    Henn-Lecordier, Laurent
    Cai, Yuhong
    Advisor
    Adomaitis, Raymond A.
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    Abstract
    This paper describes the continuing design evolution of a new approach to spatially controllable chemical vapor deposition for electronic materials manufacturing. Based on the success of a previous prototype reactor, we describe construction of a newer version of the prototype reactor system to assess its performance and identify its key operational characteristics. This new design includes a fully automated feed gas control system, allowing the reprogramming of reactor operation without hardware modifications and a time-shared gas sampling mass spectrometer for spatially resolved across-wafer gas composition analysis.
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    http://hdl.handle.net/1903/6428
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    DRUM is brought to you by the University of Maryland Libraries
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