A. James Clark School of Engineering
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The collections in this community comprise faculty research works, as well as graduate theses and dissertations.
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Item ATOMIC LAYER DEPOSITION OF NICKEL THIN FILMS FOR SPACECRAFT OPTICAL APPLICATIONS(2020) Ku, Ching-En; Adomaitis, Raymond A.; Chemical Engineering; Digital Repository at the University of Maryland; University of Maryland (College Park, Md.)Two approaches for Ni Atomic Layer Deposition on glass substrates have been studied for spacecraft optical applications. The first strategy is to first deposit a NiO thin film and then reduce the metal oxide film using noble gas under high temperature. NiCp2 and O3 as the precursors were chosen due to the low-temperature required for deposition and high growth rate. An alternative pathway was to deposit a Ru metallic film as the adsorption layer, using Ru(DMBD)(CO)3 and H2O, then deposit the Ni metallic film on the Ru film using Ni(DAD)2 and tert-butylamine. The reaction mechanisms for both processes were developed. The ideal theoretical growth rates of these ALD processes were calculated as 2.40 Å/cycle for NiO, 2.19 Å/cycle for Ru and 2.04 Å/cycle for Ni metallic film.Item An experimental and graph theoretic study of atomic layer deposition processes for spacecraft applications(2019) Salami, Hossein; Adomaitis, Raymond A; Chemical Engineering; Digital Repository at the University of Maryland; University of Maryland (College Park, Md.)Accurate understanding of the atomic layer deposition (ALD) process kinetics is necessary for developing new ALD chemistries to produce novel nanomaterials, and also optimization of typical ALD processes used in industrial applications. Proposing a potential reaction sequence alongside with accurate kinetic data is among the very first steps in studying the ALD process kinetics and forms the backbone of further engineering analysis. A valid and proper ALD reaction net work (RN) must be able to reflect the self-limiting and cycle to cycle reproducibility behavior experimentally observed for practical ALD processes. Otherwise, the mathematical model built based on it fails to precisely capture and reproduce ALD behavior no matter how accurate the available kinetic data are. In this work, a RN analysis method based on species-reaction graphs and the principles of convex analysis is developed to study the mathematical structure and dynamical behavior of thin-film deposition RN models. The key factor in ALD RN analysis is the presence of consistent surface-originated invariant states for each ALD half-cycle. Therefore, the primary focus of the proposed approach is on identifying and formulating physically-relevant RN invariant states, and to study the chemical significance of these conserved modes for ALD reaction mechanisms. The proposed method provides a well-defined framework, applicable to all ALD systems, to examine the above criteria of a proper ALD RN without requiring any information on the reaction rates. This method fills a gap in the procedure of ALD process modeling before the time-consuming step of calculating individual reaction rates which is usually done through ALD experiments in reactors equipped with in-situ measurement instruments or computationally expensive computational chemistry-based calculations such as density functional theory. The presented approach is also extended to study the variant states of a RN. The generalized method provides information on different variant states dynamically depending on each individual reaction in the network which facilitates the study and ultimately the formulation of different reaction rates in the system. In the second part of this dissertation, an experimental study of ALD of indium oxide and indium tin oxide films using the trimethylindium, tetrakis (dimethylamino) tin(IV), and ozone precursor system is conducted to first, investigate the potential application of this ALD process for producing high-quality transparent conducting layers; and second, to understand the relationship between the thickness of the deposited films and their electrical and optical properties. The optimized recipe was then used to process commercial Z93 heat radiator pigments used in manufacturing spacecraft thermal radiator panels to enhance their electrical conductivity to avoid the differential charging that may occur due to the interaction with charged particles in Van Allen radiation belts. To this aim a specialized ALD reactor was designed and constructed capable of processing standard flat substrates as well as coating micron-sized particles. The results confirm that the proposed process can be used to coat the heat radiator pigment particles and that the indium oxide film can nucleate and grow on their surface. This provides an example from a variety of potential space-related applications that can benefit from the ALD process.Item DEVELOPMENT OF VAPOR-PHASE DEPOSITED THREE DIMENSIONAL ALL-SOLID-STATE BATTERIES(2017) Pearse, Alexander John; Rubloff, Gary; Material Science and Engineering; Digital Repository at the University of Maryland; University of Maryland (College Park, Md.)Thin film solid state batteries (SSBs) are an attractive energy storage technology due to their intrinsic safety, stability, and tailorable form factor. However, as thin film SSBs are typically fabricated only on planar substrates by line-of-sight deposition techniques (e.g. RF sputtering or evaporation), their areal energy storage capacity (< 1 mWh/cm2) and application space is highly limited. Moving to three dimensional architectures provides fundamentally new opportunities in power/energy areal density scaling, but requires a new fabrication process. In this thesis, we describe the development of the first solid state battery chemistry which is grown entirely by atomic layer deposition (ALD), a conformal, vapor-phase deposition technique. We first show the importance of full self-alignment of the active battery layers by measuring and modelling the effects of nonuniform architectures (i.e. does not reduce to a one-dimensional system) on the internal reaction current distribution. By fabricating electrochemical test structures for which generated electrochemical gradients are parallel to the surface, we directly quantify the insertion of lithium into a model cathode material (V2O5) using spatially-resolved x-ray photoelectron spectroscopy (XPS). Using this new technique, we show that poorly electrically contacted high aspect ratio structures show highly nonuniform reaction current distributions, which we describe using an analytical mathematical model incorporating nonlinear Tafel kinetics. A finite-element model incorporating the effects of Li-doping on the local electrical conductivity of V2O5, which was found to be important in describing the observed distributions, is also described. Next, we describe the development of a novel solid state electrolyte, lithium polyphosphazene (LPZ), grown by ALD. We explore the thermal ALD reaction between lithium tert-butoxide and diethyl phosphoramidate, which exhibits self-limiting half-reactions and a growth rate of 0.09 nm/cycle at 300C. The resulting films are primarily characterized by in-situ XPS, AFM, cyclic voltammetry, and impedance spectroscopy. The ALD reaction forms the amorphous product Li2PO2N along with residual hydrocarbon contamination, which is determined to be a promising solid electrolyte with an ionic conductivity of 6.5 × 10-7 S/cm at 35C and wide electrochemical stability window of 0-5.3 V vs. Li/Li+ . The ALD LPZ is integrated into a variety of solid state batteries to test its compatibility with common electrode materials, including LiCoO2 and LiV2O5, as well as flexible substrates. We demonstrate solid state batteries with extraordinarily thin solid state electrolytes, mitigating the moderate ionic conductivity (< 40 nm). Finally, we describe the successful integration of the ALD LPZ into the first all-ALD solid state battery stack, which is conformally deposited onto 3D micromachined silicon substrates and is fabricated entirely at or below 250C. The battery includes ALD current collectors (Ru and TiN), an electrochemically formed LiV2O5 cathode, and a novel ALD tin nitride conversion-type anode. The full cell exhibits a reversible capacity of ~35 μAh cm-2 μmLVO -1 with an average discharge voltage of ~2V. We also describe a novel fabrication process for forming all-ALD battery cells, which is challenging due to ALD’s incompatibility with conventional lithography. By growing the batteries into 3D arrays of varying aspect ratios, we demonstrate upscaling the areal capacity of the battery by approximately one order of magnitude while simultaneously improving the rate performance and round-trip efficiency.Item Nano-Engineering of Densely Packed Electrochemical Energy Storage Architectures by Atomic Layer Deposition(2016) Liu, Chanyuan Liu; Rubloff, Gary W; Material Science and Engineering; Digital Repository at the University of Maryland; University of Maryland (College Park, Md.)Nanostructures are highly attractive for future electrical energy storage devices because they enable large surface area and short ion transport time through thin electrode layers for high power devices. Significant enhancement in power density of batteries has been achieved by nano-engineered structures, particularly anode and cathode nanostructures spatially separated far apart by a porous membrane and/or a defined electrolyte region. A self-aligned nanostructured battery fully confined within a single nanopore presents a powerful platform to determine the rate performance and cyclability limits of nanostructured storage devices. Atomic layer deposition (ALD) has enabled us to create and evaluate such structures, comprised of nanotubular electrodes and electrolyte confined within anodic aluminum oxide (AAO) nanopores. The V2O5- V2O5 symmetric nanopore battery displays exceptional power-energy performance and cyclability when tested as a massively parallel device (~2billion/cm2), each with ~1m3 volume (~1fL). Cycled between 0.2V and 1.8V, this full cell has capacity retention of 95% at 5C rate and 46% at 150C, with more than 1000 charge/discharge cycles. These results demonstrate the promise of ultrasmall, self-aligned/regular, densely packed nanobattery structures as a testbed to study ionics and electrodics at the nanoscale with various geometrical modifications and as a building block for high performance energy storage systems[1, 2]. Further increase of full cell output potential is also demonstrated in asymmetric full cell configurations with various low voltage anode materials. The asymmetric full cell nanopore batteries, comprised of V2O5 as cathode and prelithiated SnO2 or anatase phase TiO2 as anode, with integrated nanotubular metal current collectors underneath each nanotubular storage electrode, also enabled by ALD. By controlling the amount of lithium ion prelithiated into SnO2 anode, we can tune full cell output voltage in the range of 0.3V and 3V. This asymmetric nanopore battery array displays exceptional rate performance and cyclability. When cycled between 1V and 3V, it has capacity retention of approximately 73% at 200C rate compared to 1C, with only 2% capacity loss after more than 500 charge/discharge cycles. With increased full cell output potential, the asymmetric V2O5-SnO2 nanopore battery shows significantly improved energy and power density. This configuration presents a more realistic test - through its asymmetric (vs symmetric) configuration – of performance and cyclability in nanoconfined environment. This dissertation covers (1) Ultra small electrochemical storage platform design and fabrication, (2) Electron and ion transport in nanostructured electrodes inside a half cell configuration, (3) Ion transport between anode and cathode in confined nanochannels in symmetric full cells, (4) Scale up energy and power density with geometry optimization and low voltage anode materials in asymmetric full cell configurations. As a supplement, selective growth of ALD to improve graphene conductance will also be discussed[3]. References: 1. Liu, C., et al., (Invited) A Rational Design for Batteries at Nanoscale by Atomic Layer Deposition. ECS Transactions, 2015. 69(7): p. 23-30. 2. Liu, C.Y., et al., An all-in-one nanopore battery array. Nature Nanotechnology, 2014. 9(12): p. 1031-1039. 3. Liu, C., et al., Improving Graphene Conductivity through Selective Atomic Layer Deposition. ECS Transactions, 2015. 69(7): p. 133-138.Item Wafer-scale process and materials optimization in cross-flow atomic layer deposition(2009) Lecordier, Laurent Christophe; Rubloff, Gary W; Material Science and Engineering; Digital Repository at the University of Maryland; University of Maryland (College Park, Md.)The exceptional thickness control (atomic scale) and conformality (uniformity over nanoscale 3D features) of atomic layer deposition (ALD) has made it the process of choice for numerous applications from microelectronics to nanotechnology, and for a wide variety of ALD processes and resulting materials. While its benefits derive from self-terminated chemisorbed reactions of alternatively supplied gas precursors, identifying a suitable process window in which ALD's benefits are realized can be a challenge, even in favorable cases. In this work, a strategy exploiting in-situ gas phase sensing in conjunction with ex-situ measurements of the film properties at the wafer scale is employed to explore and optimize the prototypical Al2O3 ALD process. Downstream mass-spectrometry is first used to rapidly identify across the [H2O x Al(CH3)3] process space the exposure conditions leading to surface saturation. The impact of precursor doses outside as well as inside the parameter space outlined by mass-spectrometry is then investigated by characterizing film properties across 100 mm wafer using spectroscopic ellipsometry, CV and IV electrical characterization, XPS and SIMS. Under ideal dose conditions, excellent thickness uniformity was achieved (1sigma/mean<1%) in conjunction with a deposition rate and electrical properties in good agreement with best literature data. As expected, under-dosing of precursor results in depletion of film growth in the flow direction across the wafer surface. Since adsorbed species are reactive with respect to subsequent dose of the complementary precursor, such depletion magnifies non-uniformities as seen in the cross-flow reactor, thereby decorating deviations from a suitable ALD process recipe. Degradation of the permittivity and leakage current density across the wafer was observed though the film composition remained unchanged. Upon higher water dose in the over-exposure regime, deposition rates increased by up to 40% while the uniformity degraded. In contrast, overdosing of TMA and ozone (used for comparison to water) did not affect the process performances. These results point to complex saturation dynamics of water dependent on partial pressure and potential multilayer adsorption caused by hydrogen-bonding.