Nonlinear Model Reduction for RTCVD

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dc.contributor.advisorKrishnaprasad, Perinkulam S.en_US
dc.contributor.authorNewman, A.en_US
dc.contributor.authorKrishnaprasad, Perinkulam S.en_US
dc.contributor.departmentISRen_US
dc.contributor.departmentCDCSSen_US
dc.date.accessioned2007-05-23T10:06:48Z
dc.date.available2007-05-23T10:06:48Z
dc.date.issued1998en_US
dc.description.abstractIn this paper, we examine alternative methods for reducing thedimensionality of nonlinear dynamical system models arising incontrol of rapid thermal chemical vapor deposition (RTCVD) forsemiconductor manufacturing. We focus on model reduction forthe ordinary differential equation model describing heattransfer to, from, and within a semiconductor wafer in theRTCVD chamber. Two model reduction approaches are studied andcompared: the proper orthogonal decomposition and the method of balancing.This leads to a discussion of computational issues in the practicalimplementation of balancing for nonlinear systems.en_US
dc.format.extent316618 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.urihttp://hdl.handle.net/1903/6000
dc.language.isoen_USen_US
dc.relation.ispartofseriesISR; TR 1998-42en_US
dc.relation.ispartofseriesCDCSS; TR 1998-10en_US
dc.subjectlinear systemsen_US
dc.subjectnonlinear systemsen_US
dc.subjectmodel reductionen_US
dc.subjectproper orthogonal decompositionen_US
dc.subjectrapid thermal processingen_US
dc.subjectbalancingen_US
dc.subjectcomputationen_US
dc.subjectIntelligent Control Systemsen_US
dc.titleNonlinear Model Reduction for RTCVDen_US
dc.typeTechnical Reporten_US

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