Multiscale simulation of atomic layer deposition in a nanoporous material

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dc.contributor.authorDwivedi, Vivek
dc.contributor.authorAdomaitis, Raymond
dc.date.accessioned2008-08-18T14:50:50Z
dc.date.available2008-08-18T14:50:50Z
dc.date.issued2008-08-15
dc.description.abstractA multiscale simulator for alumina film growth inside a nanoporous material during an atomic layer deposition process is developed. The model combines a continuum description at the macroscopic level of precursor gas transport inside a nanopore during exposure to each of the two precursor species (trimethyaluminum and water) with a lattice Monte Carlo simulation of the film growth on the microscopic scale. Simulation results are presented for both the Monte Carlo simulation and for the multiscale system, the latter illustrating how nonuniform deposition along the nanopore can occur when insufficient precursor exposure levels are used.en
dc.description.sponsorshipNational Science Foundation grant CTS-0554045en
dc.format.extent614458 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.urihttp://hdl.handle.net/1903/8383
dc.language.isoen_USen
dc.relation.isAvailableAtInstitute for Systems Researchen_us
dc.relation.isAvailableAtDigital Repository at the University of Marylanden_us
dc.relation.isAvailableAtUniversity of Maryland (College Park, MD)en_us
dc.relation.ispartofseriesTR 2008-21
dc.subjectmultiscale simulationen
dc.subjectatomic layer depositionen
dc.titleMultiscale simulation of atomic layer deposition in a nanoporous materialen
dc.typeTechnical Reporten

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