Combinatorial Experiments Using a Spatially Programmable Chemical Vapor Deposition System

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dc.contributor.advisorAdomaitis, Raymonden_US
dc.contributor.authorSreenvivasan, Ramaswamyen_US
dc.contributor.departmentChemical Engineeringen_US
dc.contributor.publisherDigital Repository at the University of Marylanden_US
dc.contributor.publisherUniversity of Maryland (College Park, Md.)en_US
dc.date.accessioned2007-06-22T05:34:11Z
dc.date.available2007-06-22T05:34:11Z
dc.date.issued2007-05-02
dc.description.abstractA CVD reactor concept featuring a segmented design allows individual regions of a wafer to be exposed to different precursor concentrations simultaneously during a run resulting in different thickness profiles on the wafer and a thickness gradient at the boundaries between segment regions. Different recipes were cycled through each of the segments in a sequence of deposition experiments to develop a model relating precursor concentration to film thickness in each segment region. As a demonstration of spatial programmability, the system was re-programmed using this model to produce uniform thickness amongst the segments; inter-segment uniformity approaching 0.48 % (thickness standard deviation) was demonstrated. In a subsequent study, segmented CVD reactor designs enabling spatial control of across-wafer gas phase composition were evaluated for depositing graded films suitable for combinatorial studies. Specifically two reactor designs were evaluated with experiments and response surface model (RSM) based analysis to quantify the reactor performance in terms of film thickness uniformity, sensitivity to adjustable reactor operating conditions, range of thickness over which uniformity could be achieved and each reactor's ability to control the thickness gradient across the wafer surface. Design features distinguishing the two reactor systems and their influence on gradient control versus deposition rate performance are summarized. Response Surface (RS) models relating wafer state properties to process recipes are shown to be effective tools to quantify, qualify and compare different reactor designs.en_US
dc.format.extent14503239 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.urihttp://hdl.handle.net/1903/6796
dc.language.isoen_US
dc.subject.pqcontrolledEngineering, Chemicalen_US
dc.subject.pqcontrolledEngineering, Materials Scienceen_US
dc.subject.pqcontrolledEngineering, Materials Scienceen_US
dc.subject.pquncontrolledCVDen_US
dc.subject.pquncontrolledCombinatorialen_US
dc.subject.pquncontrolledThin FIlmsen_US
dc.subject.pquncontrolledALDen_US
dc.subject.pquncontrolledDeposition Toolsen_US
dc.subject.pquncontrolledEquipment Designen_US
dc.titleCombinatorial Experiments Using a Spatially Programmable Chemical Vapor Deposition Systemen_US
dc.typeDissertationen_US

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