Comparison of Run-to-Run Control Methods in Semiconductor Manufacturing Processes

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dc.contributor.advisorBaras, John S.en_US
dc.contributor.authorZhang, Changen_US
dc.contributor.authorDeng, Haoen_US
dc.contributor.authorBaras, John S.en_US
dc.contributor.departmentISRen_US
dc.date.accessioned2007-05-23T10:09:25Z
dc.date.available2007-05-23T10:09:25Z
dc.date.issued2000en_US
dc.description.abstractRun-to Run (RtR) control plays an important role in semiconductor manufacturing.<p>In this paper, RtR control methods are generalized. The set-valued RtR controllers with ellipsoidapproximation are compared with other RtR controllers bysimulation according to the following criteria: A good RtR controller should be able to compensate for variousdisturbances, such as process drifts, process shifts (step disturbance)and model errors; moreover, it should beable to deal with limitations, bounds, cost requirement, multipletargets and time delays that are often encountered in realprocesses. <p>Preliminary results show the good performance of the set-valued RtRcontroller. Furthermore, this paper shows that it is insufficient to uselinear models to approximate nonlinear processes and it is necessary to developnonlinear model based RtR controllers.en_US
dc.format.extent277574 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.urihttp://hdl.handle.net/1903/6136
dc.language.isoen_USen_US
dc.relation.ispartofseriesISR; TR 2000-33en_US
dc.subjectestimationen_US
dc.subjectoptimal controlen_US
dc.subjectoptimizationen_US
dc.subjectmanufacturingen_US
dc.subjectmeasurementsen_US
dc.subjectrun-to-run controlen_US
dc.subjectellipsoiden_US
dc.subjectmodified OVE algorithmen_US
dc.subjectDHOBE algorithmen_US
dc.subjectrobust controlen_US
dc.subjectcomparisonen_US
dc.subjectOAQC methoden_US
dc.subjectEWMA methoden_US
dc.subjectKIRCen_US
dc.subjectANN-EWMAen_US
dc.subjectSensor-Actuator Networksen_US
dc.subjectNext-Generation Product Realization Systemsen_US
dc.titleComparison of Run-to-Run Control Methods in Semiconductor Manufacturing Processesen_US
dc.typeTechnical Reporten_US

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