REU Report: The Essentials of a Vacuum System

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dc.contributor.advisorSreenivasan, Ramaswamyen_US
dc.contributor.authorJamal, Hasinaen_US
dc.contributor.departmentISRen_US
dc.date.accessioned2007-05-23T10:18:24Z
dc.date.available2007-05-23T10:18:24Z
dc.date.issued2005en_US
dc.description.abstractThe parts of a chemical vapor deposition (CVD) reactor were examined extensively to create a procedure for placing a metal wafer into the loading chamber, transferring it into the reaction chamber, returning it to the loading chamber, then taking it back out. The instructions were created to learn about vacuum technology.en_US
dc.format.extent135408 bytes
dc.format.mimetypeapplication/pdf
dc.identifier.urihttp://hdl.handle.net/1903/6581
dc.language.isoen_USen_US
dc.relation.ispartofseriesISR; UG 2005-1en_US
dc.subjectNext-Generation Product Realization Systemsen_US
dc.titleREU Report: The Essentials of a Vacuum Systemen_US
dc.typeThesisen_US

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