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Influence of Gas Composition on Wafer Temperature Control in a Tungsten Chemical Vapor Deposition Reactor

Chang, Hsiao-Yung; Adomaitis, Raymond A.; Kidder, John N., Jr.; Rubloff, Gary W. (2000)

Experimental measurements of wafer temperature in a single-wafer,lamp-heated CVD system were used to study the wafer temperature responseto gas composition. A physically based simulation procedure for theprocess gas and ...