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An Object-Oriented Programming Approach to Implement Global Spectral Methods: Application to Dynamic Simulation of a Chemical Infiltration Process
(2000)
Boundary-value problems (BVPs) in relatively simple geometriescan be solved using global spectral methods. These discretizationmethods are applicable to a wide range of problems and are suitablefor a "rapid prototyping" ...
Software and Other Teaching Tools Applied to Modeling and Analysis of Distributed Parameter Systems
(1997)
Over the last two years, we have been developing a library of Matlab subprograms integrated with on-line lecture notes in the form of WWW documents which are used in both undergraduate and graduate-level Chemical Engineering ...
Analysis of Heat Transfer in a Chemical Vapor Deposition Reactor: An Eigenfunction Expansion Solution Approach
(1997)
A numerical solution procedure combining several weighted residual methods and based on global trial function expansion is developed to solve a model for the steady state gas flow field and temperature distribution in a ...
Integrated Dynamic Simulation of Rapid Thermal Chemical Vapor Deposition of Polysilicon
(1997)
A physically-based dynamic simulator has been constructed to investigate the time-dependent behavior of equipment process, sensor, and control system for rapid thermal chemical vapor deposition (RTCVD) of polysilicon from ...
Polysilicon RTCVD Process Optimization for Environmentally- Conscious Manufacturing
(1996)
In the semiconductor manufacturing industry, optimization of advanced equipment and process designs must include both manufacturing metrics (such as cycle time, consumables cost, and product quality) and environmental ...
Model Reduction for RTCVD Optimization
(1996)
A model of a three-zone Rapid Thermal Chemical Vapor Deposition (RTCVD) system is developed to study the effects of spatial wafer temperature patterns on polysilicon deposition uniformity. A sequence of simulated runs is ...
Randomized Difference Two-Timescale Simultaneous Perturbation Stochastic Approximation Algorithms for Simulation Optimization of Hidden Markov Models
(2000)
We proposetwo finite difference two-timescale simultaneous perturbationstochastic approximation (SPSA)algorithmsfor simulation optimization ofhidden Markov models. Stability and convergence of both thealgorithms is ...
Education in Semiconductor Manufacturing Processes through Physically-Based Dynamic Simulation
(1997)
We have developed physically-based dynamic simulators relevant to semiconductor manufacturing processes, which realistically reflect the time-dependent behavior of equipment, process, sensor, and control systems using ...
A Collocation/Quadrature-Based Sturm-Liouville Problem Solver
(1999)
We present a computational method for solving a class of boundary-value problemsin Sturm-Liouville form. The algorithms are based on global polynomialcollocation methods and produce discrete representationsof the eigenfunctions. ...
RTCVD Model Reduction: A Collocation on Empirical Eigenfunctions Approach
(1995)
A model of a three-zone Rapid Thermal Chemical Vapor Deposition (RTCVD) system is developed to study the effects of spatial wafer temperature patterns and gas-phase reactant depletion on polysilicon deposition uniformity. ...