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Analysis of Heat Transfer in a Chemical Vapor Deposition Reactor: An Eigenfunction Expansion Solution Approach
A numerical solution procedure combining several weighted residual methods and based on global trial function expansion is developed to solve a model for the steady state gas flow field and temperature distribution in a ...
Integrated Dynamic Simulation of Rapid Thermal Chemical Vapor Deposition of Polysilicon
A physically-based dynamic simulator has been constructed to investigate the time-dependent behavior of equipment process, sensor, and control system for rapid thermal chemical vapor deposition (RTCVD) of polysilicon from ...
Education in Semiconductor Manufacturing Processes through Physically-Based Dynamic Simulation
We have developed physically-based dynamic simulators relevant to semiconductor manufacturing processes, which realistically reflect the time-dependent behavior of equipment, process, sensor, and control systems using ...