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Analysis of Heat Transfer in a Chemical Vapor Deposition Reactor: An Eigenfunction Expansion Solution Approach
(1997)
A numerical solution procedure combining several weighted residual methods and based on global trial function expansion is developed to solve a model for the steady state gas flow field and temperature distribution in a ...
Integrated Dynamic Simulation of Rapid Thermal Chemical Vapor Deposition of Polysilicon
(1997)
A physically-based dynamic simulator has been constructed to investigate the time-dependent behavior of equipment process, sensor, and control system for rapid thermal chemical vapor deposition (RTCVD) of polysilicon from ...
Design Similarity Measures for Process Planning and Design Evaluation
(1997)
Design engineers and process planners need to search for similar designs. Design engineers use similar designs to estimate a new design's manufacturability. Like process planners, who need to generate process plans before ...
Education in Semiconductor Manufacturing Processes through Physically-Based Dynamic Simulation
(1997)
We have developed physically-based dynamic simulators relevant to semiconductor manufacturing processes, which realistically reflect the time-dependent behavior of equipment, process, sensor, and control systems using ...