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Integrated Dynamic Simulation of Rapid Thermal Chemical Vapor Deposition of Polysilicon
(1997)
A physically-based dynamic simulator has been constructed to investigate the time-dependent behavior of equipment process, sensor, and control system for rapid thermal chemical vapor deposition (RTCVD) of polysilicon from ...
Education in Semiconductor Manufacturing Processes through Physically-Based Dynamic Simulation
(1997)
We have developed physically-based dynamic simulators relevant to semiconductor manufacturing processes, which realistically reflect the time-dependent behavior of equipment, process, sensor, and control systems using ...