Reaction path analysis for atomic layer deposition systems
Proceedings of Foundations of Computer-Aided Process Optimization / Chemical Process Control (FOCAPO/CPC) 2017
MetadataShow full item record
In this paper, we examine the mathematical structure of thin-film deposition process reaction kinetics models with the goal of determining whether a reaction network can guarantee the self-limiting and stable growth inherent in true atomic layer deposition systems. This analysis is based on identifying reaction invariants and interpreting the chemical significance of these conserved modes. A species-reaction graph approach is introduced to aid in distinguishing “proper” from problematic ALD reaction networks.