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Effect of Free Chlorine Oxidation on the Deposition Kinetics of Bacteriophage MS2 on a Silica Surface

dc.contributor.advisorMi, Baoxiaen_US
dc.contributor.authorStephens, Heungkook Noriomoralen_US
dc.date.accessioned2015-07-17T05:31:33Z
dc.date.available2015-07-17T05:31:33Z
dc.date.issued2015en_US
dc.identifierhttps://doi.org/10.13016/M2RK8C
dc.identifier.urihttp://hdl.handle.net/1903/16779
dc.description.abstractUnderstanding the transport kinetics of water contaminates such as pathogenic viruses around solid surfaces is important in controlling groundwater contaminant plumes and optimizing contaminant removal in sand filtration units. The effect of increasing oxidative stress, in the form of small doses of free chlorine, on the deposition behavior of bacteriophage MS2 onto a silica surface was examined using a quartz crystal microbalance with dissipation (QCM-D). MS2 deposition rates were analyzed by reaction time and inactivation level. A statistically significant increase in the deposition rate was identified between MS2 test solutions not exposed to free chlorine and most test solutions that were exposed. However, as exposure to free chlorine was increased, no relationship was able to be deduced from the collected deposition data. Potential explanations based on previous work were discussed. Observations also indicated that more comprehensive purification procedures in comparison to previous studies were necessary to obtain accurate QCM-D data.en_US
dc.language.isoenen_US
dc.titleEffect of Free Chlorine Oxidation on the Deposition Kinetics of Bacteriophage MS2 on a Silica Surfaceen_US
dc.typeThesisen_US
dc.contributor.publisherDigital Repository at the University of Marylanden_US
dc.contributor.publisherUniversity of Maryland (College Park, Md.)en_US
dc.contributor.departmentCivil Engineeringen_US
dc.subject.pqcontrolledEnvironmental engineeringen_US
dc.subject.pqcontrolledEnvironmental scienceen_US
dc.subject.pquncontrolledChlorineen_US
dc.subject.pquncontrolledDepositionen_US
dc.subject.pquncontrolledMS2en_US
dc.subject.pquncontrolledOxidationen_US
dc.subject.pquncontrolledQCM-Den_US
dc.subject.pquncontrolledSilicaen_US


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