A Wavelet Approach to Wafer Temperature Measurement via Diffuse Reflectance Spectroscopy
Krishnaprasad, Perinkulam S.
Dayawansa, Wijesuriya P.
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A methodology for the determination of wafer temperature in Molecular Beam Epitaxy via diffuse reflectance measurements is developed. Approximate physical principles are not used, instead, patterns in the data (reflectance versus wavelength) are exploited via wavelet decomposition and Principal Component Analysis.